Advanced Thin Film Technologies has the capability to meet all your thin film coating requirements. Several systems are dedicated to commonly used coatings, such as, Aluminum (Al, Al-4%Cu ), Chromium(Cr), Saphire or Aluminum Oxide(Al₂O₃), Cermet(CrSiO) , Copper(Cu) , Gold(Au) , Indium(In) , ITO, Lithium Fluoride (LiF), Magnesium(Mg) , Magnessium Fluoride , Nickel (Ni), NiCr Palladium(Pd) , Silicon(Si), Quartz or Silicon Dioxide(SiO₂) , Silicon Monoxide(SO) , Si₃O₄, Silicon Nitride, Silver(Ag), Tin(Sn) , Titanium(Ti),  TaN-TiW-Au, Ti-Pt-Au, Ti-Pd-Au, Cr-Ni-Au, Au-Sn and Au-Ge. Several other type of materials are kept in stock for quick turn around of other type of coatings.

State of the art monitoring equipment ensures consistent coatings of the highest quality.  Physical vapor deposition (PVD) in vacuum are the techniques employed for thin film deposition and preparation. Above are some of our capabilities, to discuss your requirements please contact us.